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Published April 15, 2026 at 8:00 PM
Updated May 20, 2026
Site work and new construction of a laboratory facility in Albany, New York. Completed plans call for the construction of a laboratory facility.
New York State, through NY CREATES, is establishing North America's first publicly owned and accessible High NA Extreme Ultraviolet (EUV) Lithography Center at the Albany NanoTech Complex. The project includes construction and build-out of the NanoFab Reflection (NFR) building and installation of the world's most advanced semiconductor manufacturing tools, including Tokyo Electron's CLEAN TRACK(TM) LITHIUS Pro DICE(TM) wafer coater/developer system and ASML's High NA EUV lithography system. The initiative is supported by a large-scale public-private partnership involving major semiconductor industry leaders and is intended to advance next-generation chip research, development, and manufacturing capabilities in New York State.
Under Construction
Laboratories
$614,000,000.00
Public - State/Provincial
New Construction, Site Work
Plans and Specifications are not available for this project. If that changes, they will be made available here.
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